MIT/Lincoln Labs CCID20 7-4-2 CCD Test Results

This is the first MIT/Lincoln Labs 2Kx4K CCD from the 6-inch fab line. It is from a test lot done to verify the operation of the line and the 6-inch masks for our CCDs. This is a high-resistivity CCD.

A summary report is available. Noteworthy points about this CCD include:

• This was a test CCD. We are still evaluating it in the lab. The following are very early results on the brickwall.

Original postscript files are available from our anonymous ftp server and these provide better resolution and clarity than is usually possible on a web page. Here are a few figures to illustrate device highlights:

Brick wall

This is the pattern which results from the incomplete backside laser anneal. The pattern is much smaller on this device than on any previous CCID20 we've tested.

The brickwall QE variations seen on earlier devices is almost gone in this CCD. The peak-to-peak amplitude is only about 3% at 4000Å. The first image shows the brickwall QE variation pattern in the central 2Kx2K of the CCD.

This second image shows a very small section of the image above enlarged to reveal a pixel-to-pixel variation with an RMS deviation of about 5% which is even bigger than the more global brickwall pattern. We assume this QE variation results from small-scale variations in the AR coating.

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