MIT/Lincoln Labs CCID20 W88C2 CCD Test Results
This is a standard epi phase 2 MIT/Lincoln Labs 2Kx4K
CCD. It exhibits the type 3 pattern (bad brick wall) from the backside
boron implant and laser anneal process.
A summary report is available.
Noteworthy points about this CCD include:
- The new backside processing gives this device very bad
QE uniformity which is both color and temperature sensitive.
- Other characteristics (QE, read noise, full well, etc.)
as shown in the summary report are typical. QE as a function of temperature
was measured.
Original postscript files are available from our anonymous
ftp server and these provide better resolution and clarity than is
usually possible on a web page. Here are a few figures to illustrate device
highlights:
- "Brick wall" pattern
- This CCD suffers from the type 3 brick wall QE variation.
This is a particularly bad form of brick wall pattern.
- Serial and Parallel CTE
- CTE measurements are very good.
The pattern shown here is characteristic
of what we call type 3 brick wall. This image shows the QE variation at
its worst - at 4000A and at -130C. The plot following the image shows how
the variation grows smaller with higher temperature or longer wavelength.
The Lincoln CCID20 design
produces excellent charge transfer efficiency. This is illustrated in the
following plot. The measured serial CTE is 0.99998.
Back
to Lincoln Labs Top Page